In this study

a vapor chamber with an internal flow channel and a phase change working fluid R1233zd is studied. The vapor chamber is placed between the cold source and heat source. The temperature field of the vapor chamber is analyzed theoretically and by simulation. Furthermore

the temperature distribution is obtained by experiments. The experimental results show that the temperature distribution of the vapor chamber is consistent with that of the cold source. The temperature distribution is affected by the power of the heat source and the temperature of the cold source. When the power of the heat source rises from 345 W to 690 W and the temperature of the cold source remains at 0 ℃

the average temperature of the vapor chamber increases from 13.20 ℃ to 25.84 ℃

and the temperature difference increases from 11.10 ℃ to 25.70 ℃ . When the temperature of the cold source reduces from 0 ℃ to -5 ℃ and the power of the heat source remains at 690 W

the average temperature of the vapor chamber decreases from 25.84 ℃ to 18.15 ℃

and the temperature difference decreases from 25.70 ℃ to 16.60 ℃ . Under different working conditions

the thermal resistance of the vapor chamber is approximately 0.03 K/W

which shows that the vapor chamber has good thermal conductivity.